High-density microwave plasma for high-rate and low-temperature deposition of silicon thin film
| Autor: | Sakuma, Y, Haiping, L, Ueyama, H, Shirai, H * |
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| Zdroj: | In Vacuum 2000 59(1):266-276 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Sakuma, Y, Haiping, L, Ueyama, H, Shirai, H * |
|---|---|
| Zdroj: | In Vacuum 2000 59(1):266-276 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect