Effect of composition on thermal stability and electrical resistivity of Ta–Si–N films
Autor: | Olowolafe, J.O *, Rau, I, Unruh, K.M, Swann, C.P, Jawad, Z.S, Alford, T |
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Zdroj: | In Thin Solid Films 2000 365(1):19-21 |
Databáze: | ScienceDirect |
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