Comparative study of thin film physical properties for TiNx deposited by DC magnetron sputtering under temperatures less than 100°C on monocrystalline silicon and polycrystalline iron substrates

Autor: Roquiny, Ph. *, Poulet, A., Leys, Y., Descamps, J.-C., Bodart, F., VandenBrande, P.
Zdroj: In Thin Solid Films 1 November 1999 355-356:357-362
Databáze: ScienceDirect