Deposition of silicon carbon nitride films by ion beam sputtering

Autor: Wu, J.-J *, Wu, C.-T, Liao, Y.-C, Lu, T.-R, Chen, L.C, Chen, K.H, Hwa, L.-G, Kuo, C.-T, Ling, K.-J
Zdroj: In Thin Solid Films 1 November 1999 355-356:417-422
Databáze: ScienceDirect