The high-density microwave plasma for high rate deposition of microcrystalline silicon
| Autor: | Shirai, Hajime *, Sakuma, Yoshikazu, Ueyama, Hiroyuki |
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| Zdroj: | In Thin Solid Films 1999 345(1):7-11 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Shirai, Hajime *, Sakuma, Yoshikazu, Ueyama, Hiroyuki |
|---|---|
| Zdroj: | In Thin Solid Films 1999 345(1):7-11 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect