Silicidation reactions with Co–Ni bilayers for low thermal budget microelectronic applications
| Autor: | Saha, S.K. *, Howell, R.S., Hatalis, M.K. |
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| Zdroj: | In Thin Solid Films 1999 347(1):278-283 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Saha, S.K. *, Howell, R.S., Hatalis, M.K. |
|---|---|
| Zdroj: | In Thin Solid Films 1999 347(1):278-283 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect