Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering
| Autor: | Nosaka, Toshikazu *, Yoshitake, Masaaki, Okamoto, Akio, Ogawa, Soichi, Nakayama, Yoshikazu |
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| Zdroj: | In Thin Solid Films 6 July 1999 348(1-2):8-13 |
| Databáze: | ScienceDirect |
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