Properties of films of multilayered ZnO: Al and ZnO deposited by an alternating sputtering method
| Autor: | Tominaga, K., Murayama, T., Umezu, N., Mori, I., Ushiro, T., Moriga, T., Nakabayashi, I. |
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| Zdroj: | In Thin Solid Films 1999 343:160-163 |
| Databáze: | ScienceDirect |
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