Chemical vapor deposition of copper–cobalt binary films
| Autor: | Gu, Shuo, Atanasova, Paolina, Hampden-Smith, Mark J., Kodas, Toivo T. * |
|---|---|
| Zdroj: | In Thin Solid Films 1999 340(1):45-52 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Gu, Shuo, Atanasova, Paolina, Hampden-Smith, Mark J., Kodas, Toivo T. * |
|---|---|
| Zdroj: | In Thin Solid Films 1999 340(1):45-52 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect