Stability and transport properties of microcrystalline Si 1− xGe x films
Autor: | Edelman, F, Raz, T *, Komem, Y, Stölzer, M, Werner, P, Zaumseil, P, Osten, H.-J, Griesche, J, Capitan, M |
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Zdroj: | In Thin Solid Films 1999 337(1):152-157 |
Databáze: | ScienceDirect |
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