Stability and transport properties of microcrystalline Si 1− xGe x films

Autor: Edelman, F, Raz, T *, Komem, Y, Stölzer, M, Werner, P, Zaumseil, P, Osten, H.-J, Griesche, J, Capitan, M
Zdroj: In Thin Solid Films 1999 337(1):152-157
Databáze: ScienceDirect