State creation induced by gate bias stress in unhydrogenated polysilicon TFTs
| Autor: | Tala-Ighil, B., Rahal, A., Mourgues, K., Toutah, A., Pichon, L., Mohammed-Brahim, T. *, Raoult, F., Bonnaud, O. |
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| Zdroj: | In Thin Solid Films 1999 337(1):101-104 |
| Databáze: | ScienceDirect |
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