Utilizing H2S to sulfurize transition metal and oxide barriers for suppressing resistivity scaling of ruthenium metallization
| Autor: | Chen, Yu-Lin, Hsiao, Kai-Yuan, Jhan, Dun-Jie, Lu, Ming-Yen, Keng, Pei Yuin, Chiu, Kun-An, Lin, Yu-Wei, Chang, Shou-Yi |
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| Zdroj: | In Thin Solid Films 15 August 2024 802 |
| Databáze: | ScienceDirect |
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