Pulsed chemical vapor deposition for crystalline aluminum nitride thin films and buffer layers on silicon and silicon carbide
| Autor: | McLeod, Aaron J., Ueda, Scott T., Lee, Ping C., Spiegelman, Jeff, Kanjolia, Ravindra, Moinpour, Mansour, Woodruff, Jacob, Kummel, Andrew C. |
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| Zdroj: | In Thin Solid Films 1 March 2023 768 |
| Databáze: | ScienceDirect |
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