Deposition of silicon oxide films on silicon using HelixJet - an atmospheric-pressure plasma jet process below 100 °C
| Autor: | Rebohle, L., Quade, A., Schumann, T., Blaschke, D., Hübner, R., Heller, R., Foest, R., Schäfer, J., Skorupa, W. |
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| Zdroj: | In Thin Solid Films 1 July 2022 753 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect