In situ ellipsometry monitoring of TiO[formula omitted] atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H[formula omitted]O precursors on Si and In[formula omitted]Ga[formula omitted]As substrates
| Autor: | Skopin, E.V., Abdukayumov, K., Abi Younes, P., Anikin, M., Roussel, H., Deschanvres, J.-L., Renevier, H. |
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| Zdroj: | In Thin Solid Films 1 April 2021 723 |
| Databáze: | ScienceDirect |
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