Helium ion penetration in sputtering cathode materials: A crucial process for the helium treatment of oxide thin films
| Autor: | Wang, Haoru, Xie, Xiangnan, Lin, Guankai, Wang, Yongqiang, Tong, Wei, Zhu, Hong |
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| Zdroj: | In Thin Solid Films 1 November 2020 713 |
| Databáze: | ScienceDirect |
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