Chemical vapor deposition of Cu films from copper(I) cyclopentadienyl triethylphophine: Precursor characteristics and interplay between growth parameters and films morphology
| Autor: | Prud'homme, Nathalie, Constantoudis, Vassilios, Turgambaeva, Asiya E., Krisyuk, Vladislav V., Samélor, Diane, Senocq, François, Vahlas, Constantin |
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| Zdroj: | In Thin Solid Films 1 May 2020 701 |
| Databáze: | ScienceDirect |
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