Enhanced zirconia oxide dielectric quality of germanium p-channel metal oxide semiconductor field effect transistor by in-situ low temperature treatment in atomic layer deposition process
| Autor: | Ruan, Dun-Bao, Chang-Liao, Kuei-Shu, Li, Ji-Syuan, Yi, Shih-Han |
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| Zdroj: | In Thin Solid Films 1 May 2020 701 |
| Databáze: | ScienceDirect |
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