Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition

Autor: Katamune, Yūki, Mori, Hiroto, Morishita, Fumihiro, Izumi, Akira
Zdroj: In Thin Solid Films 1 February 2020 695
Databáze: ScienceDirect