Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy
| Autor: | Saghaeian, F., Keckes, J., Woehlert, S., Rosenthal, M., Reisinger, M., Todt, J. |
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| Zdroj: | In Thin Solid Films 1 December 2019 691 |
| Databáze: | ScienceDirect |
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