Oxygen incorporated during deposition determines the crystallinity of magnetron-sputtered Ta3N5 films
| Autor: | Rudolph, M., Vickridge, I., Foy, E., Alvarez, J., Kleider, J.-P., Stanescu, D., Magnan, H., Herlin-Boime, N., Bouchet-Fabre, B., Minea, T., Hugon, M.-C. |
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| Zdroj: | In Thin Solid Films 1 September 2019 685:204-209 |
| Databáze: | ScienceDirect |
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