Bipolar high power impulse magnetron sputtering for energetic ion bombardment during TiN thin film growth without the use of a substrate bias
| Autor: | Viloan, Rommel Paulo B., Gu, Jiabin, Boyd, Robert, Keraudy, Julien, Li, Liuhe, Helmersson, Ulf |
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| Zdroj: | In Thin Solid Films 31 October 2019 688 |
| Databáze: | ScienceDirect |
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