Concepts for in situ characterization and control of plasma ion assisted deposition processes
| Autor: | Harhausen, J., Foest, R., Stenzel, O., Wilbrandt, S., Franke, C., Brinkmann, R.P. |
|---|---|
| Zdroj: | In Thin Solid Films 1 March 2019 673:94-103 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect