Effect of substrate bias and substrate/plasma generator distance on properties of a-C:H:SiOx films synthesized by PACVD
| Autor: | Grenadyorov, A.S., Solovyev, А.А., Oskomov, K.V., Rabotkin, S.V., Elgin, Y.I., Sypchenko, V.S., Ivanova, N.M. |
|---|---|
| Zdroj: | In Thin Solid Films 1 January 2019 669:253-261 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect