Impact of silica-substrate chemistry on tantalum nitride thin films deposited by atomic layer deposition: Microstructure, chemistry and electrical behaviors
| Autor: | Volpi, Fabien, Cadix, Lionel, Berthomé, Gregory, Coindeau, Stéphane, Encinas, Thierry, Jourdan, Nicolas, Blanquet, Elisabeth |
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| Zdroj: | In Thin Solid Films 1 January 2019 669:392-398 |
| Databáze: | ScienceDirect |
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