Ga-doped ZnO films magnetron sputtered at ultralow discharge voltages: Significance of controlling defect generation

Autor: Chen, Yuyun, Meng, Fanping, Ge, Fangfang, Xu, Genbao, Huang, Feng
Zdroj: In Thin Solid Films 30 August 2018 660:840-845
Databáze: ScienceDirect