Preparation and characterization of copper thin film obtained by metal plasma immersion ion implantation and deposition
| Autor: | dos Santos, Demetrio Jackson, Ito, Nathalie Minako, de Oliveira, Mara Cristina Lopes, Tavares, Lara Basílio, Salvadori, Maria Cecilia, Antunes, Renato Altobelli |
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| Zdroj: | In Thin Solid Films 1 March 2018 649:136-141 |
| Databáze: | ScienceDirect |
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