Dielectric barrier layers by low-temperature plasma-enhanced atomic layer deposition of silicon dioxide
| Autor: | Barako, Michael T., English, Timothy S., Roy-Panzer, Shilpi, Kenny, Thomas W., Goodson, Kenneth E. |
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| Zdroj: | In Thin Solid Films 1 March 2018 649:24-29 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect