Cleaning level of the target before deposition by reactive direct current magnetron sputtering
| Autor: | Hernandez Utrera, O., Abundiz-Cisneros, N., Sanginés, R., Diliegros-Godines, C.J., Machorro, R. |
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| Zdroj: | In Thin Solid Films 31 January 2018 646:98-104 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect