Variation of local chemical compositions of (Ti, Al)N films on inner wall of small hole deposited by high-power impulse magnetron sputtering

Autor: Komiya, Hidetoshi, Shimizu, Tetsuhide, Teranishi, Yoshikazu, Morikawa, Kazuo, Yang, Ming
Zdroj: In Thin Solid Films 31 December 2017 644:99-105
Databáze: ScienceDirect