Improving the degree of crystallinity of magnetron-sputtered Ta3N5 thin films by augmenting the ion flux onto the substrate

Autor: Rudolph, M., Demeter, A., Foy, E., Tiron, V., Sirghi, L., Minea, T., Bouchet-Fabre, B., Hugon, M.-C.
Zdroj: In Thin Solid Films 31 August 2017 636:48-53
Databáze: ScienceDirect