Method for Al thin film surface nanostructuring using Al imprinting and anodic oxidation: Application to a high capacitance density metal-insulator-metal capacitor

Autor: Hourdakis, Emmanouel, Nassiopoulou, Androula G.
Zdroj: In Thin Solid Films 1 January 2017 621:36-41
Databáze: ScienceDirect