Working gas effect on properties of Al2O3 film in plasma-enhanced atomic layer deposition
| Autor: | Hur, M., Lee, J.Y., Kang, W.S., Lee, J.O., Song, Y.-H., Kim, S.J., Kim, I.D. |
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| Zdroj: | In Thin Solid Films 30 November 2016 619:342-346 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect