Pressure dependence of (Ti, Al)N film growth on inner walls of small holes in high-power impulse magnetron sputtering

Autor: Shimizu, Tetsuhide, Komiya, Hidetoshi, Teranishi, Yoshikazu, Morikawa, Kazuo, Nagasaka, Hiroshi, Yang, Ming
Zdroj: In Thin Solid Films 28 February 2017 624:189-196
Databáze: ScienceDirect