WC/C:H films synthesized by an hybrid reactive magnetron sputtering/Plasma Enhanced Chemical Vapor Deposition process: An alternative to Cr (VI) based hard chromium plating
Autor: | Nouvellon, C., Belchi, R., Libralesso, L., Douhéret, O., Lazzaroni, R., Snyders, R., Thiry, D. |
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Zdroj: | In Thin Solid Films 30 May 2017 630:79-85 |
Databáze: | ScienceDirect |
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