WC/C:H films synthesized by an hybrid reactive magnetron sputtering/Plasma Enhanced Chemical Vapor Deposition process: An alternative to Cr (VI) based hard chromium plating

Autor: Nouvellon, C., Belchi, R., Libralesso, L., Douhéret, O., Lazzaroni, R., Snyders, R., Thiry, D.
Zdroj: In Thin Solid Films 30 May 2017 630:79-85
Databáze: ScienceDirect