Resistivity of atomic layer deposition grown ZnO: The influence of deposition temperature and post-annealing
| Autor: | Laube, J., Nübling, D., Beh, H., Gutsch, S., Hiller, D., Zacharias, M. |
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| Zdroj: | In Thin Solid Films 31 March 2016 603:377-381 |
| Databáze: | ScienceDirect |
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