Atomic layer deposition of stoichiometric Co3O4 films using bis(1,4-di-iso-propyl-1,4-diazabutadiene) cobalt
| Autor: | Han, Byeol, Park, Jae-Min, Choi, Kyu Ha, Lim, Wan-Kyu, Mayangsari, Tirta R., Koh, Wonyong, Lee, Won-Jun |
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| Zdroj: | In Thin Solid Films 31 August 2015 589:718-722 |
| Databáze: | ScienceDirect |
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