Ion beam sputter deposition of Ge films: Influence of process parameters on film properties
| Autor: | Bundesmann, C., Feder, R., Wunderlich, R., Teschner, U., Grundmann, M., Neumann, H. |
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| Zdroj: | In Thin Solid Films 31 August 2015 589:487-492 |
| Databáze: | ScienceDirect |
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