Electrical properties of Bi-implanted amorphous chalcogenide films
Autor: | Fedorenko, Y.G., Hughes, M.A., Colaux, J.L., Jeynes, C., Gwilliam, R.M., Homewood, K., Gholipour, B., Yao, J., Hewak, D.W., Lee, T.-H., Elliott, S.R., Curry, R.J. |
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Zdroj: | In Thin Solid Films 31 August 2015 589:369-375 |
Databáze: | ScienceDirect |
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