Electrical properties of Bi-implanted amorphous chalcogenide films

Autor: Fedorenko, Y.G., Hughes, M.A., Colaux, J.L., Jeynes, C., Gwilliam, R.M., Homewood, K., Gholipour, B., Yao, J., Hewak, D.W., Lee, T.-H., Elliott, S.R., Curry, R.J.
Zdroj: In Thin Solid Films 31 August 2015 589:369-375
Databáze: ScienceDirect