Study of Cu diffusion behavior in carbon rich SiCN:H films deposited from trimethylphenylsilane
| Autor: | Ermakova, E., Mogilnikov, K., Rumyantsev, Yu., Kichay, V., Maximovskii, E., Semenova, O., Kosinova, M. |
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| Zdroj: | In Thin Solid Films 3 August 2015 588:39-43 |
| Databáze: | ScienceDirect |
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