Diffusion barrier property of MnSixOy layer formed by chemical vapor deposition for Cu advanced interconnect application
Autor: | Nguyen, Mai Phuong, Sutou, Yuji, Koike, Junichi |
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Zdroj: | In Thin Solid Films 1 April 2015 580:56-60 |
Databáze: | ScienceDirect |
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