Deposition and characterization of amorphous aluminum nitride thin films for a gate insulator
| Autor: | Oikawa, H., Akiyama, R., Kanazawa, K., Kuroda, S., Harayama, I., Nagashima, K., Sekiba, D., Ashizawa, Y., Tsukamoto, A., Nakagawa, K., Ota, N. |
|---|---|
| Zdroj: | In Thin Solid Films 1 January 2015 574:110-114 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect