Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness

Autor: Shimizu, Tetsuhide, Teranishi, Yoshikazu, Morikawa, Kazuo, Komiya, Hidetoshi, Watanabe, Tomotaro, Nagasaka, Hiroshi, Yang, Ming
Zdroj: In Thin Solid Films 30 April 2015 581:39-47
Databáze: ScienceDirect