Impact of pulse duration in high power impulse magnetron sputtering on the low-temperature growth of wurtzite phase (Ti,Al)N films with high hardness
Autor: | Shimizu, Tetsuhide, Teranishi, Yoshikazu, Morikawa, Kazuo, Komiya, Hidetoshi, Watanabe, Tomotaro, Nagasaka, Hiroshi, Yang, Ming |
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Zdroj: | In Thin Solid Films 30 April 2015 581:39-47 |
Databáze: | ScienceDirect |
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