The effect of process parameters on the structure, photocatalytic and self-cleaning properties of TiO2 and Ag-TiO2 coatings deposited using reactive magnetron sputtering
| Autor: | Navabpour, P., Ostovarpour, S., Hampshire, J., Kelly, P., Verran, J., Cooke, K. |
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| Zdroj: | In Thin Solid Films 28 November 2014 571 Part 1:75-83 |
| Databáze: | ScienceDirect |
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