Transparent silicon nitride films prepared by surface wave plasma chemical vapor deposition under low temperature conditions
| Autor: | Azuma, Kazufumi, Ueno, Satoko, Konishi, Yoshiyuki, Takahashi, Kazuhiro |
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| Zdroj: | In Thin Solid Films 1 April 2015 580:111-115 |
| Databáze: | ScienceDirect |
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