Copper deposition in microporous silicon using supercritical fluid

Autor: Jin, Lianhua, Oya, Toshifumi, Tamekuni, Shigeaki, Watanabe, Mitsuhiro, Kondoh, Eiichi, Gelloz, Bernard
Zdroj: In Thin Solid Films 30 September 2014 567:82-86
Databáze: ScienceDirect