Optical metrology of thick photoresist process for advanced 3D applications
| Autor: | Nolot, E., André, A., Scibetta, C., Poulingue, M., Levin, L., Vignoud, L., Isselé, H. |
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| Zdroj: | In Thin Solid Films 28 November 2014 571 Part 3:609-614 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect