Plasma enhanced chemical vapor deposition process optimization for thin film silicon tandem junction solar cells
| Autor: | Rohde, Martin, Zelt, Matthias, Gabriel, Onno, Neubert, Sebastian, Kirner, Simon, Severin, Daniel, Stolley, Tobias, Rau, Björn, Stannowski, Bernd, Schlatmann, Rutger |
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| Zdroj: | In Thin Solid Films 2 May 2014 558:337-343 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect