Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures
| Autor: | Ait Aissa, K., Achour, A., Camus, J., Le Brizoual, L., Jouan, P.-Y., Djouadi, M.-A. |
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| Zdroj: | In Thin Solid Films 1 January 2014 550:264-267 |
| Databáze: | ScienceDirect |
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